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Principal Engineer, RET Design

Micron Technology, Inc. · Boise, ID · Advanced Mask Development

Employment type

Full-time

Work setting

On-site

Location

Boise, ID

Schedule

Day shift

Posted

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Job overview

The Principal Engineer, RET Design is an onsite role based in Boise, ID, with compensation not specified. This position supports the Micron Technology Advanced Mask Development team by developing reticle solutions for advanced memory products. The role exists to solve complex patterning challenges through advanced lithography and precision manufacturing. The engineer will optimize RET and OPC solutions to enable high-fidelity wafer patterning and support the company's technology roadmap.

What you'll do

  • Develop and implement RET and OPC solutions
  • optimize lithography methodologies and tapeout processes
  • analyze patterning issues and drive corrective actions
  • lead mask development projects
  • mentor engineers.

What we're looking for

Skills & competencies
full-time
day shift
boise id
micron
ret design
lithography
opc
semiconductor
mask development
engineering
Work arrangement
  • Weekend coverage required

Benefits & perks

  • Choice of medical, dental and vision plans, income protection programs, paid family leave, paid time-off program, and paid holidays.

Why this role

Requires 6+ years of experience in RET, OPC, lithography, or mask development.

About the employer

Micron Technology, Inc. is hiring for this role. Industry: Computer Systems Design Services. Sector: 54.

Additional details

Industry sector
54
Industry
Computer Systems Design Services
Occupation code
17-2041.00
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